Hiroyuki SUDA
- Present Status
- Electrical & Electronics Section
- Present Post
Partner of Nakamura & Partners
Patent Attorney- Main Practices
- Patent Prosecution and Litigation (Specialized in polymer materials and semiconductors)
- Languages
- Japanese and English
- Education and History
Graduated from Faculty of Engineering, Yamagata University (B.S., M.S.(Polymer Materials Engineering));
Worked for Chemical Company as a Researcher from 1989 to 1993;
Joined Nakamura & Partners in 1993;
Passed the Patent Bar Examination in 1996;
Studied at Meiji University, Faculty of Law from 1998 to 1999 (LL.B., 1999);
Studied at The George Washington University Law School from 2001 to 2002 (LL.M., 2002);
Passed the U.S. Patent Bar Examination in 2003;
Passed the New York State Bar Examination in 2004;
Assistant Partner of Nakamura & Partners in 2004;
Partner of Nakamura & Partners in 2005- Membership and Activities
Japan Patent Attorneys Association (1997-)
The New York State Bar Association (2004-)
AIPPI·EJAPAN
Editor of AIPPI Journal (2005-)
Chief Editor of AIPPI Journal (2008-)- Main Articles
(written in Japanese)
"Claim Construction of U.S. Patents - Phillips Case" PATENT by Japan Patent Attorneys Association (2005)- Main Lectures
"Counseling Foreign Practitioners Filing Cases in the USPTO - Japanese Views -", AIPLA Spring Meeting (2006)
"Foreign Patent Seminar", Japan Institute of Invention and Innovation (2007)
"Inventive Step�|Danger of Hindsight Mentioned by the IP High Court", AIPLA Mid-Winter Institute (2008)
"Recent Developments in Japanese Intellectual Property Law", AIPLA Trilateral Meeting (2008)
