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Hiroyuki SUDA

Present Status
Electrical & Electronics Section
Present Post

Partner of Nakamura & Partners
Patent Attorney

Main Practices
Patent Prosecution and Litigation (Specialized in polymer materials and semiconductors)
Languages
Japanese and English
Education and History

Graduated from Faculty of Engineering, Yamagata University (B.S., M.S.(Polymer Materials Engineering));
Worked for Chemical Company as a Researcher from 1989 to 1993;
Joined Nakamura & Partners in 1993;
Passed the Patent Bar Examination in 1996;
Studied at Meiji University, Faculty of Law from 1998 to 1999 (LL.B., 1999);
Studied at The George Washington University Law School from 2001 to 2002 (LL.M., 2002);
Passed the U.S. Patent Bar Examination in 2003;
Passed the New York State Bar Examination in 2004;
Assistant Partner of Nakamura & Partners in 2004;
Partner of Nakamura & Partners in 2005

Membership and Activities

Japan Patent Attorneys Association (1997-)
The New York State Bar Association (2004-)
AIPPI·EJAPAN
  Editor of AIPPI Journal (2005-)
  Chief Editor of AIPPI Journal (2008-)

Main Articles

(written in Japanese)
"Claim Construction of U.S. Patents - Phillips Case" PATENT by Japan Patent Attorneys Association (2005)

Main Lectures

"Counseling Foreign Practitioners Filing Cases in the USPTO - Japanese Views -", AIPLA Spring Meeting (2006)

"Foreign Patent Seminar", Japan Institute of Invention and Innovation (2007)

"Inventive Step�|Danger of Hindsight Mentioned by the IP High Court", AIPLA Mid-Winter Institute (2008)

"Recent Developments in Japanese Intellectual Property Law", AIPLA Trilateral Meeting (2008)

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